| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 |
| filingDate |
2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36844556e1623bd1ca3dd322ef9f2f67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bacbc6eb6995ecee57a38ade9fddb75c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c944a2ea1dd29f4637d0ab9bc5ac415f |
| publicationDate |
2013-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130111355-A |
| titleOfInvention |
Photosensitive resin composition, the manufacturing method of the pattern using this |
| abstract |
Provided is a photosensitive resin composition having excellent sensitivity, resolution and spherical shape. (A-1) Polymer which has a structural unit represented by general formula (a-1) and the structural unit which has an acidic radical, (A-2) Polymer which has a structural unit represented by general formula (a-2), (B ) Photosensitive resin composition containing photo-acid generator and (C) solvent. |
| priorityDate |
2012-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |