http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130105501-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2013-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_368f3adf309874820f1cd2166e6641b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f00b304bd547a0fac0f03948f2310cbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10b9845da719074d94bccfec34444a3c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43 |
| publicationDate | 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130105501-A |
| titleOfInvention | Solvent Development Negative Resist Composition, Method of Forming Resist Pattern |
| abstract | The present invention provides a solvent development negative resist composition and a method of forming a resist pattern. The present invention uses a resist composition containing a base component (A) whose solubility in an organic solvent is reduced by the action of an acid, an acid generator component (B) which generates an acid by exposure and a basic compound component (D) A step of forming a resist film on a support, a step of exposing the resist film, and a step of forming a resist pattern by a negative type development using a developer containing the organic solvent (A1) comprising an ether-containing cyclic group having 3 to 7-membered rings and a structural unit (a1) containing an acid-decomposable group having an increased polarity due to the action of an acid as the resist composition, , Wherein the basic compound component (D) contains a fluorine atom-containing alkaline compound component (D1) And a solvent-developing negative resist composition. |
| priorityDate | 2012-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 351.