| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d79a3714d75520adeea100b7ed428a77 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0203 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0216 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04 |
| filingDate |
2012-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4178d443d78c1e83237eba37e764c579 |
| publicationDate |
2013-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130101113-A |
| titleOfInvention |
Solar cell wafer and its manufacturing method |
| abstract |
An object of the present invention is to provide a solar cell wafer which has a porous layer on the surface of a semiconductor wafer including a silicon wafer and can further reduce the reflection loss of light on the surface. In the solar cell wafer 100 of the present invention, the porous layer 11 having a hole diameter of 10 nm or more and 45 nm or less and a layer thickness of greater than 50 nm and 450 nm or less on at least one surface 10A of the semiconductor wafer 10. It is characterized by having). |
| priorityDate |
2011-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |