http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130086305-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1229111a198f86af4112ecd730b55cd9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-6489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-35 |
| filingDate | 2013-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7739b51872c39f2f93d9d6ea03f46bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eefc74e92c4445f88671be742286b776 |
| publicationDate | 2013-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130086305-A |
| titleOfInvention | Method for determining surface contamination of polycrystalline silicon |
| abstract | According to the present invention, a) providing two polycrystalline silicon rods by deposition in a Siemens reactor; b) immediately after the deposition, determining a degree of contamination of the first of the two rods; c) guiding the second rod through at least one system for further processing the polycrystalline silicon rod to obtain a rod piece or polysilicon fragment, optionally cleaning, storing or packaging d) then determining the contamination level of the second rod Lt; / RTI > A method of determining surface contamination of polycrystalline silicon is provided, wherein the difference in contamination determined in the first rod and the second rod provides the surface contamination of polycrystalline silicon resulting from the system and the system environment. |
| priorityDate | 2012-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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