| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fa4c37b4aacb317ee027a1a729de4ff |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2011-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52672b3a168f18ba6a8532bd03d1f08d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88eb89ec79746502e9946c582076c0e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc978639edd0b6a8e19d22a163316e0c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e688636c1dd07e2f87a9dcae0de692af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b96d229b28937c4a973b2821c3289bd4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5aa0d9532016df3c4a68d712d89ff39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dde153915c0e61d2b05fbdce4f4de8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5e6fbaa26cc965c272769b3473bfafc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e077b920fe6b5a823535e7ab29a6b0d5 |
| publicationDate |
2013-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130078559-A |
| titleOfInvention |
Photoresist composition and insulation layer produced from the same |
| abstract |
PURPOSE: A photosensitive resin composition is provided to facilitate to form positive or negative patterns as the dielectric constant is low, and the water-development of siloxane resin itself is possible, and to have excellent transparency and heat resistance. CONSTITUTION: A photosensitive resin composition comprises siloxane resin formed by including a first organic silane monomer represented by Chemical formula 1, and a second organic silane monomer represented by Chemical formula 2; a photoresist; and an organic solvent. The siloxane resin includes 10-90 parts by weight of the first organic silane monomer and 90-10 parts by weight of the second organic silane monomer. The acid value of the siloxane resin is 10-300 mgKOH/g. The content of the photoresist is 1-50 parts by weight to 100.0 parts by weight of the siloxane resin. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114430767-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114430767-A |
| priorityDate |
2011-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |