http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130050387-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 |
| filingDate | 2011-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcd0bcbad3ba50a81b13a9bf1b4835b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e3258de90e09cc630896cb501a8ced3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a549d2b56fbabdf2cc6d01a236e3b138 |
| publicationDate | 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130050387-A |
| titleOfInvention | Polymer and resist material containing the same and pattern formation method using the same |
| abstract | A resist polymer suitable for microfabrication performed by dry exposure, immersion exposure, or double patterning, a resist material containing the same, and a pattern formation method using the resist material are provided. General formula (1) below: (37) (In formula (1), R < 1> is a hydrogen atom, a halogen atom, a methyl group, or a trifluoromethyl group each independently, and R < 2> -R < 9> is respectively independently a hydrogen atom, a C1-C20 linear, carbon number Is a 3-20 branched or cyclic hydrocarbon group, wherein a part of the carbon atoms constituting them may be substituted with an oxygen atom, two hydrogen atoms bonded to the same carbon may be replaced with an oxygen atom, and may be = O. H of CH bond is substituted with OH and optionally a C-OH, or may be part or all of the hydrogen atom of the R 2 ~ R 9 is substituted with a fluorine atom. in addition, any or all of R 2 ~ R 9 May be bonded to form a cyclic structure, and n and m each contain carbon atoms, each independently an integer of 0 to 5), and a repeating unit having an acid-decomposable group. It uses a copolymer. |
| priorityDate | 2010-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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