http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130046431-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2011-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3c9de8e17deb76acd01d2e187f11ef2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aed3da245984185c752ee62935ace589 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6990198dd6b31314b784d3cde874cbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c2bdd6dc202dc9e38663ed7bae4c128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ff651eff6fc8ba8d837a5260f894108 |
| publicationDate | 2013-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130046431-A |
| titleOfInvention | Water repellent protective film forming agent, chemical liquid for forming water repellent protective film and wafer cleaning method using the chemical liquid |
| abstract | According to the present invention, in the manufacture of a semiconductor device, a wafer containing a substance containing a silicon element on at least the concave portion surface of the concave-convex pattern, or at least a portion of the concave surface of the concave-convex pattern is titanium, titanium nitride, tungsten, aluminum And a method for cleaning a wafer while preventing the collapse of a pattern of the wafer comprising at least one material selected from the group consisting of copper, tin, tantalum nitride, and ruthenium, and forming a water-repellent protective film capable of efficiently cleaning the wafer. And a water repellent protective film-forming chemical liquid containing the agent, and a wafer cleaning method using the chemical liquid. In cleaning of the said wafer, it is a water-repellent protective film forming agent for forming a water-repellent protective film in the surface of at least the recessed part of the said wafer, and the said agent is a silicon compound represented by following General formula [1]. (Formula 14) |
| priorityDate | 2010-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 130.