| abstract |
Provided are a resist composition and a method of forming a resist pattern capable of forming a fine resist pattern with good lithographic properties, a novel high molecular compound useful for the resist composition, and a compound useful as a monomer of the high molecular compound. The said resist composition contains the high molecular compound (A) which has a structural unit (a0) represented by the following general formula (a0). In formula (a0), A is an anion represented by the following general formula (1) or (2). |