| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C49-747
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-2055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-315 |
| filingDate |
2005-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae849cba97bfb2df5c7c7d3f9dea43e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 |
| publicationDate |
2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130042036-A |
| titleOfInvention |
Compound for resist and radiation sensitive composition |
| abstract |
A radiation sensitive composition comprising 1 to 80% by weight of the solid component and 20 to 99% by weight of the solvent. The solid component is (a) a polyphenol compound synthesized by a condensation reaction of a compound having 5 to 36 carbon atoms and a divalent tetravalent aromatic ketone or an aromatic aldehyde and a compound containing 1 to 3 phenolic hydroxyl groups having 6 to 15 carbon atoms. The compound (B) which has a structure which introduce | transduced the acid dissociable functional group into the at least 1 phenolic hydroxyl group of (A), and has a molecular weight of 400-2000 is included. The composition containing the compound (B) is highly sensitive to radiation such as KrF excimer laser, extreme ultraviolet rays, electron beams or X-rays, and can form a resist pattern having high resolution, high heat resistance, and high etching resistance. It is useful as an amplification type non-polymeric resist material. |
| priorityDate |
2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |