| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d21cbff64022f95c237c0bd3ec8656ca |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2203-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2518-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 |
| filingDate |
2011-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_862ea8a31bd6fd10d70728a9f5ad1319
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e7bb3228af3e8b58f9b0544727842f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e132eb569342b8857461ff205c563ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56ffd226eae922baad089226974562a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc295f90acf79c60db70aac66e4d4051 |
| publicationDate |
2013-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130039727-A |
| titleOfInvention |
Silicon-containing block copolymers, synthesis methods and uses |
| abstract |
The present invention describes the synthesis of silicon containing monomers and copolymers. Synthesis of Monomer, Trimethyl- (2-methylenebut-3-enyl) silane (TMSI) and Subsequent Synthesis of Diblock Copolymer and Styrene (Forming Polystyrene-Block-Polytrimethylsilyl Isoprene), and Diblock Copolymer Polystyrene Synthesis of Block-Polymethacryloxymethyltrimethylsilane or PS-bP (MTMSMA). Such silicon-containing diblock copolymers have a variety of uses. One preferred application is as a novel imprint template material with sub 100 nm features for lithography. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140147718-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150092397-A |
| priorityDate |
2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |