http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130032692-A

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filingDate 2011-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_001b1f44eec166f49bb93c82cf1ac127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853858fdd3ca65f4ded7d71994edadea
publicationDate 2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20130032692-A
titleOfInvention Graphene thin film manufacturing method
abstract The present invention relates to a method for producing a graphene thin film. The graphene thin film manufacturing method of the present invention by using a reciprocating linear motion device by coating a graphene oxide solution on the substrate by reciprocating linear motion on the substrate while the deposition plate is in contact with the substrate while being connected to the reciprocating linear motion device, Graphene thin film can be prepared. Therefore, the graphene thin film manufacturing method of the present invention can produce a graphene thin film having optical or electrical properties equal to or higher by using a smaller amount of graphene oxide solution than the conventional graphene thin film manufacturing method. A uniform graphene thin film of area can be produced in a short time. In addition, the method for producing a graphene thin film of the present invention because the graphene oxide solution is directly coated on the substrate, it is possible to form the graphene thin film on a variety of substrates without a separate transfer process.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11056559-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160056765-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190045581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150079419-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160056485-A
priorityDate 2011-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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