| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d87ffa416d3f351ebcd0fdaaf743c05b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513 |
| publicationDate |
2013-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130024853-A |
| titleOfInvention |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film |
| abstract |
(Problem) Pattern formation method capable of forming a negative pattern having high resolution and high etching resistance using KrF light, electron beam and EUV light and having reduced development residue defect, and actinic ray sensitivity or sensitivity used in the method Providing a radioactive resin composition and actinic ray-sensitive or radiation-sensitive film. (Resolution) (A) A resin which contains a repeating unit having a group which is decomposed by the action of an acid and exhibits a polar group, and further has a reduced solubility in an organic solvent due to the action of an acid containing an aromatic group, (B) active light Or a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition comprising a nonionic compound in which an acid is generated by irradiation with radiation, and (C) a solvent, exposing the film, and exposing the exposed film to an organic solvent. The pattern formation method containing the process of forming a negative pattern by developing using the developing solution containing these. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180011193-A |
| priorityDate |
2011-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |