abstract |
Even if the pattern is formed repeatedly, the curable composition for imprints excellent in pattern formability is provided. A curable composition for imprints containing a polymerizable compound (A), a photopolymerization initiator (B) and a nonpolymerizable compound (C), wherein dissolution of the nonpolymerizable compound (C) in the curable composition for imprint is exothermic. Curable composition for imprint. |