| abstract |
A novel antireflective coating composition is provided, the antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, and (c) one or more polymers: Wherein U 1 and U 2 are independently a C 1 -C 10 alkylene group; V is selected from C 1 -C 10 alkylene, arylene and aromatic alkylene; W is selected from H, C 1 -C 10 alkyl, aryl, alkylaryl and V-OH; Y is selected from H, W, and U 3 C (O) OW, wherein U 3 is independently a C 1 -C 10 alkylene group and m is 1-10. Also provided is a method of using the composition as an antireflective coating for a substrate in a lithography process. |