| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81a5d1f0d5dfdf51d2495345dd56dccc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B35-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e10ce328b3dd8b7b73f68c7df087024b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f53a161f732eaf8bcff2514e30608e5a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e107c2216cbd3e6b299e3ce27fd71e6f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_956b2250c8587a52a1c9f6999e35e137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_135a222f4d3d0266cdc72db4913e032c |
| publicationDate |
2013-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130015224-A |
| titleOfInvention |
Semiconductor manufacturing equipment for epitaxial process |
| abstract |
According to an embodiment of the present invention, a semiconductor manufacturing apparatus includes a cleaning chamber in which a cleaning process is performed on a substrate; An epitaxial chamber in which an epitaxial process of forming an epitaxial layer is formed on the substrate; And a transfer chamber coupled to the side of the cleaning chamber and the epitaxial chamber and having a substrate handler for transferring the substrate having the cleaning process completed to the epitaxial chamber, wherein the cleaning chamber includes a plurality of substrates. It is characterized by the arrangement type which is made with respect to. |
| priorityDate |
2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |