http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130007676-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_781c429e4e20536916ff74dcbe1b5417 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-963 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-77 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-547 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F1-00 |
| filingDate | 2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebf25c991c30532eb64bdf46a90f7a41 |
| publicationDate | 2013-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130007676-A |
| titleOfInvention | SB-Te alloy powder for sintering, manufacturing method thereof and sintered body target |
| abstract | A sintered compact target made of Sb-Te-based alloy powder and Sb-Te-based alloy for sintering, which is made of a powder having an average particle diameter of 0.1 to 200 µm and has an oxygen content of 1000 wtppm or less, and has an oxygen content of 1000 wtppm or less, A sintered compact target made of Sb-Te-based alloys having a drag force of 50 MPa or more and a relative density of 99% or more. Uniformity and miniaturization of the Sb-Te-based alloy sputtering target structure are suppressed to suppress crack generation of the sintered target and prevent arcing during sputtering. Moreover, unevenness | corrugation of the surface by sputter erosion is reduced and the Sb-Te type alloy sputtering target of favorable quality is obtained. |
| priorityDate | 2008-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.