| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-213 |
| filingDate |
2012-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c1002fa78c03a72affe449d919a134e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96b26a94579c5b945bd5cccfdf72d7dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0002810a30b6e9de0cb9460ad628c8c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ca8df0f7e88f59f2c1b45d44676cf4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f5b55376d7e73381f5a718697f80380 |
| publicationDate |
2012-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120140216-A |
| titleOfInvention |
Fluorine-containing sulfonate resins, fluorine-containing N-sulfonyloxyimide resins, resist compositions and pattern formation methods using the same, polymerizable fluorine-containing sulfonate salts, polymerizable fluorine-containing N-sulfonyloxyimide compounds, fluorine-containing sulfonate ester resins, and Polymerizable Fluorinated Sulfonate Ester Compound |
| abstract |
A sulfonate onium salt or fluorine-containing N-sulfonyloxyimide compound is included in the side chain to provide a resin having an anion fixed on the resin side, and a resin having high DOF, LER, sensitivity, and resolution. A compound represented by formula (In formula, X represents a hydrogen atom or a fluorine atom each independently. N represents the integer of 1-10. R represents a hydrogen atom, a halogen atom, a C1-C3 alkyl group, or a fluorine-containing alkyl group. J is Represents a divalent linking group, a being 0 or 1.) Fluorine-containing sulfonate resin or fluorine-containing sulfonate ester resin which has a structure represented by these. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180127924-A |
| priorityDate |
2011-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |