| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2010-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6be7193058a949caf9450a897605fb2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7adadbdd730e7b1a5674f80f59f99a1b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15510851673a706449283a03eca80ce1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_703d13b81965e9b7ddfb32282582128d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94281e17932b65cf4259099c76ff8f35 |
| publicationDate |
2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120139790-A |
| titleOfInvention |
The photosensitive resin composition, the photosensitive element, the formation method of a resist pattern, and the manufacturing method of a printed wiring board using the same |
| abstract |
The present invention relates to a direct imaging method comprising (A) a binder polymer, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein (B) the photopolymerizable compound comprises a compound represented by the following formula The present invention also provides a photosensitive resin composition for use in the formation of a resist pattern. (Wherein R 1 and R 2 each independently represent a hydrogen atom or a methyl group, and n represents an integer of 0 to 50) |
| priorityDate |
2010-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |