| abstract |
As a resist composition containing the base component (A) which changes the solubility to a developing solution by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure, this base component (A) is the following general It has a structural unit (a0) represented by a formula (a0-1), and the structural unit (a1) containing the acid-decomposable group whose polarity increases by the effect | action of an acid, and the content rate of this structural unit (a0) is 50 mol%. The resist composition containing less than resin component (A1). [In formula, R is a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group; R 1 is a divalent linking group; R 2 is a -SO 2 -containing cyclic group; v is 0 or 1] |