| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ca8383425b1fe77487ce198d4da2f74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa6ad110a9fc9438dfb4b88af17bc2c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aec00597203d63642baa58ab43ec580e |
| publicationDate |
2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120119220-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
The present invention is a polyimide resin of a specific structure; Photoinitiators; A crosslinking agent; And a photosensitive resin composition comprising an organic solvent; And an organic insulating film or a photosensitive pattern formed from the photosensitive resin composition, wherein the photosensitive resin composition exhibits high adhesion to a substrate used in a semiconductor device or a display device, and has excellent mechanical properties and high developability. It is possible to obtain a photosensitive resin capable of forming an ultrafine pattern while having a. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190061844-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160020229-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180081264-A |
| priorityDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |