| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C257-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C257-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2005-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_502adc95ab64f293058d115cd448901d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_408c5c237358db939f26cc511c4b1005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7151e18fde8ddf3023fe57a7a9f1051c |
| publicationDate |
2012-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120105057-A |
| titleOfInvention |
Copper (I) compounds useful as deposition precursors for copper thin films |
| abstract |
The present invention provides a copper (I) amidate precursor for forming a copper thin film in the manufacture of a semiconductor device, and a method for depositing a copper (I) amidate precursor on a substrate using a chemical vapor deposition or atomic layer deposition process. It is about. |
| priorityDate |
2004-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |