http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120088658-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89abab811069c64e02454132b3ab9bc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27ce997496ad602504ce5bcdd2f965aa |
| publicationDate | 2012-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20120088658-A |
| titleOfInvention | Polymers, radiation-sensitive compositions and monomers, and methods of making the same |
| abstract | SUMMARY OF THE INVENTION An object of the present invention is to provide a radiation-sensitive composition, a polymer and a monomer, and a manufacturing method thereof, which can form a chemically amplified positive resist film having excellent nano edge roughness, sensitivity and resolution, and capable of stably forming a fine pattern with high precision. To provide. The radiation sensitive composition of this invention contains the acid dissociable group containing polymer and the radiation sensitive acid generator which contain the repeating unit represented by following General formula (1). <Formula (1)> (In the above formula, R 1 is a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group, R 2 is a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y is a carbon atom, X is hetero with Y A group of atoms necessary to form a cyclic structure containing atoms, and represents -X 1 Z 1 X 2- , wherein Z 1 is -O-, -S-, -CO-, -COO-, -SO- or -SO 2- X 1 and X 2 are the same or different from each other and are a single bond, a methylene group or an alkylene group having 2 to 25 carbon atoms, X 1 and X 2 may have a substituent, and X 1 and X 2 are present in each Carbon atoms may be bonded to a divalent group) |
| priorityDate | 2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 528.