http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120084272-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2012-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd6c171f54af1de5467932c43b2f320c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cb18b15193f3483d0d7f021d452dd2f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd817b3b4b7b6b42ab0ea6796adcec2 |
| publicationDate | 2012-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20120084272-A |
| titleOfInvention | Chemically Amplified Positive Resist Materials and Pattern Forming Methods |
| abstract | (A) An alkali insoluble or poorly soluble polymer compound having an acidic functional group protected with an acid labile group, wherein the polymer compound becomes alkali-soluble when the acid labile group is released, (B) an acid generator, and (C) At least one selected from nonionic nitrogen-containing organosiloxane compounds containing a nonionic nitrogen-containing surfactant and a perfluoropolyether group, and having a polyoxyalkylene-type polyether bond, consisting of a perfluoroalkylethylene oxide adduct A chemically amplified positive resist material containing ultraviolet light having a wavelength of 150 nm or more as an exposure light source, characterized by containing a nonionic fluorine-based compound. EFFECTS According to the present invention, there is provided a chemically amplified resist material which is excellent in coating uniformity and capable of suppressing an edge crown, which is a phenomenon in which the film thickness becomes extremely thick at the periphery of the substrate as a resist material which does not form a scam. can do. |
| priorityDate | 2011-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 536.