| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_17a2003d0a80109168c2470109046997 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2030-8886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0004 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N30-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J4-002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N30-00 |
| filingDate |
2010-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f68a60c8d490734f86c76394e1ed9fcd |
| publicationDate |
2012-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120083300-A |
| titleOfInvention |
Apparatus for manufacturing polycrystalline silicon and method for controlling the apparatus |
| abstract |
Systems and methods are disclosed for producing polycrystalline silicon according to a monosilane process. At least one reactor 10, at least one converter 20, at least one injection tank 30 and at least one evaporator 40 are provided. Each reactor 10 is provided with an inlet tube 11a for fresh gas mixture and an outlet tube 11b for partially used gas mixture. Likewise, each converter 20 includes an outlet tube 21 for the gas mixture and each evaporator 40 also includes an outlet tube 41 for the gas mixture. Several sampling elements 7 for the sample to be measured are provided with the inlet pipe 11a and the outlet pipe 11b of each reactor 10 and the outlet pipe 21 and the evaporator 40 of each converter 20. It is provided in the outflow pipe 41. The drawn sample to be measured is supplied to the at least one gas phase chromatograph through the tube 8 by the sampling element 7. |
| priorityDate |
2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |