| abstract |
The present invention relates to a photosensitive resin composition for black matrix. The photosensitive resin composition for black resists according to the present invention includes a florin-containing polyfunctional monomer in a specific content in the polyfunctional monomer, thereby improving processability and improving adhesion to the lower substrate after a hard baking process, and thus, easy to implement a fine pattern. In addition, there is a feature that can reduce the defects caused by bursting during the sealing of the LCD substrate and the substrate separation failure due to the impact of the finished LCD product. |