| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0163 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f4a2e47ac57c5044a9f176695ade09f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_685bbe5a9510f83733ff7aabf6615392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_612be57bd9e1d0049291af98872d8a74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f402386fe698f0134153c5a478f3585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f131b16f2f1faf7e612f21f7095125a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb62ba474979697c51a457d02b78aa1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_732a5f1715905158789748cac7f52d35 |
| publicationDate |
2012-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120077484-A |
| titleOfInvention |
Positive photosensitive resin composition, the photosensitive resin film manufactured using this, and the semiconductor element containing the said photosensitive resin film |
| abstract |
(A) a polybenzoxazole precursor comprising a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), and comprising a first polybenzoxazole precursor having a thermopolymerizable functional group in at least one terminal portion; (B) a photosensitive diazoquinone compound; (C) silane compound; (D) phenolic compounds; And (E) a positive photosensitive resin composition comprising a solvent and a photosensitive resin film prepared using the same. |
| priorityDate |
2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |