http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120072934-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_964715652eb394808baf941c5b3eb33a
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
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filingDate 2010-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d9364c088c9ba21b1452c71789fc73a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29302dafaee00b118f7bb4c7f1678f58
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publicationDate 2012-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20120072934-A
titleOfInvention A large area micropattern manufacturing method using laser interference exposure, a non-planar area transfer method of a micropattern produced using the above method, and an article in which the micropattern is transferred using the same
abstract The present invention relates to a method of transferring a non-planar area of a fine pattern and an article obtained by transferring the fine pattern using the same, and more particularly, a sacrificial layer and a pattern forming layer are coated on a substrate having a planar structure, and then, on the coated pattern forming layer. The present invention relates to a method of transferring a fine pattern non-planarly by forming a fine pattern in a large area, separating the pattern forming layer on which the fine pattern has been transferred, and attaching it to an article to be applied, and an article to which the fine pattern is transferred using the same.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150122891-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9617146-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160092730-A
priorityDate 2010-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 27.