Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-12042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-12036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-12 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022425 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
2011-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3f0aba3c95fccd4da7e13b82d4173a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e2c3d4ed1a97525ecb80cc321cf6e8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e928646c076bba9097fd581c44cad58 |
publicationDate |
2012-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20120065958-A |
titleOfInvention |
Electrochemical Etching of Semiconductors |
abstract |
A semiconductor is provided that is electrochemically etched in a solution containing a non-fluoride source and nickel ions. Electrochemical etching can form pores in the nanometer range on the semiconductor surface. The etched semiconductor is then nickel plated. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180107712-A |
priorityDate |
2010-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |