| abstract |
According to the photosensitive resin composition containing (A), (B1), (B2), (C), and (D), the pattern excellent in a mechanical characteristic can be obtained. (A) alkali-soluble resin (B1) carbon number 2? Polymeric compound having a cyclic ether structure of 4 and an ethylenically unsaturated bond (B2) A polymerizable compound different from (B1) (C) polymerization initiator (D) solvent |