| abstract |
The acid-containing organic compound component (C) containing the base component (A) in which the solubility in the developer is changed by the action of the acid, the compound (C1) represented by the following general formula (c1), and the exposure is generated. A resist composition comprising an acid generator component (B) (except for the compound (C1)), wherein R N is a nitrogen-containing heterocyclic group which may have a substituent; X 0 is a linear or branched divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, a divalent aliphatic hydrocarbon group having a cyclic or cyclic partial structure having 3 to 20 carbon atoms, or a part of hydrogen atoms thereof, or All are groups substituted with a fluorine atom; M + is organic cation]. [Formula 1] |