| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2010-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d903d169bbe9813f245249144da874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_319905d527776c37a99d1a4cc621e425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ca8383425b1fe77487ce198d4da2f74 |
| publicationDate |
2012-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120061314-A |
| titleOfInvention |
Etching solution composition and manufacturing method of semiconductor device using same |
| abstract |
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an etchant composition, which is safe for handling and use, and can be used to etch an oxide film with a high etching selectivity while minimizing the loss of nitride film. It can be applied effectively. |
| priorityDate |
2010-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |