| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62fdba7df52864f2aeb98ddce78d9a12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2010-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d47ee89f0131c5bd693d359ead2cd2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0803f6ce9bd07780d7faa8ea671d57b |
| publicationDate |
2012-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120034684-A |
| titleOfInvention |
Chemically Amplified Positive Photoresist Composition |
| abstract |
Photoresist composition. The composition has: (a) at least one resin binder comprising at least one acid sensitive group and substantially free of phenol groups protected by acetal or ketal groups; (b) one or more photoacid generators that, upon exposure to a high energy light source, decompose and generate a mineral strong enough to remove one or more acid sensitive groups; (c) at least one ionic non-photosensitive additive comprising an iminium salt; And (d) at least one solvent. Also provided is a method of patterning a relief structure on a substrate using a photoresist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140056098-A |
| priorityDate |
2009-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |