| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_965c914ec970566cea33def2ed09574c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c48d279206339a634b268922e6bdc099
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bac32187258e85c36a05f8fdba4ef5e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e807583113fe3bd65dcf760759119a9 |
| publicationDate |
2012-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120034439-A |
| titleOfInvention |
Positive photoresist composition for chip on film |
| abstract |
The present invention (a) a first alkali-soluble resin containing a compound having an alkali development rate of 5 to 15nm / s; (b) a second alkali soluble resin; (c) dissolution inhibitors; And (d) relates to a positive photoresist composition for a chip on film comprising a solvent. |
| priorityDate |
2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |