| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C255-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C205-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a7f370388bbd092746549722b253007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdae697df2ea8f34a395e20f6b520a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad6f2018726d7b9d9323115f7bc3ecc3 |
| publicationDate |
2012-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120033267-A |
| titleOfInvention |
Radiation-sensitive resin compositions, polymers and compounds |
| abstract |
An object of the present invention is to shorten the time required to reduce the hydrophobicity after immersion exposure while increasing the hydrophobicity of the film surface during immersion exposure. The present invention comprises a polymer [A] comprising a repeating unit (a1) having a group represented by any one of the following formulas (1-1) to (1-3), further comprising a fluorine atom, and a radiation sensitive acid generator The radiation sensitive resin composition containing [B] is provided. |
| priorityDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |