http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120019242-A

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publicationDate 2012-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20120019242-A
titleOfInvention Polishing slurry and method for manufacturing semiconductor device using same
abstract A polishing slurry and a method of manufacturing a semiconductor device using the same are provided. Polishing slurry according to an embodiment of the present invention, a slurry for polishing an aluminum film, the polishing agent; Oxidizing agents; Corrosion inhibitors; And a polishing rate reducing agent, wherein the anionic compound is negatively charged in the slurry.
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