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filingDate 2011-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fa6d445c90c691c5444959a614bf120
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publicationDate 2012-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20120001694-A
titleOfInvention Three-dimensional nanostructure and its manufacturing method
abstract The present invention relates to a three-dimensional nanostructure and a method of manufacturing the same, and more specifically, to the target material by applying an ion bombardment (ion bombardment) through a physical ion etching process on the outer peripheral surface of the patterned polymer structure After forming the target material-polymer composite structure, and then removing the polymer of the target material-polymer composite structure to prepare a nanostructure, the three-dimensional nanostructures of various shapes having a high aspect ratio and uniformity in large areas and the preparation thereof It is about a method. The method for manufacturing a three-dimensional nanostructure according to the present invention is manufactured by applying the ion bombardment phenomenon through physical ion etching, thereby producing a three-dimensional nanostructure having a high aspect ratio and uniformity in a simple process and low cost. By controlling the pattern and shape of the polymer structure, it is easy to manufacture structures of various shapes, and at the same time, it is possible to form uniform fine nanostructures having a thickness of 10 nm or less. It is effective to realize the high performance of the nano device.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170055245-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200046289-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101509529-B1
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priorityDate 2010-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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