| abstract |
The present invention is a radiation-sensitive resin composition capable of forming a chemically amplified positive resist film which is effectively sensitive to extreme ultraviolet rays such as EUV, has excellent sensitivity, and can stably form a fine pattern with high precision. 1, a polymer comprising a repeating unit (i) represented by the formula (2) and / or formula (3) and a repeating unit (ii) represented by the formula (4), R 1 is a hydrogen atom or a methyl group, R 2 is an alkyl group, alkoxy It is a group or an alicyclic hydrocarbon group, p is 0-3, q is 1-3, p + q <= 5. <Formula 1> <Formula 2> <Formula 3> <Formula 4> |