| abstract |
One or more first solvents selected from the group consisting of HF, sulfone and selenone, the only acid and the only fluoride compound in the composition, one or more polyhydroxyl alkyl or aryl alcohol co-solvents with metal ion complexing or binding sites, and A cleaning composition for cleaning a microelectronic or nanoelectronic device comprising water, and any one or more phosphonic acid corrosion inhibitor compounds, wherein the composition is free of amines, bases, and other salts. |