| abstract |
(A) It provides the resist composition for negative tone development containing the resin which has an acid-decomposable repeating unit represented by following General formula (1), and whose solubility in negative developing solution can be reduced by the action of an acid. In General Formula (1), Xa 1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry 1 to Ry 3 each independently represents an alkyl group or a cycloalkyl group, and two or more of Ry 1 to Ry 3 each other. You may bond and form a ring structure, and Z represents a bivalent coupling group. |