| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-6452 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2010-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_224ad91782b7d0fb914016761ce6828e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4aacfe1a1bc43453ae254a20df67b39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a446afea376c1d64aaf4ec4a4d89426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4a23d3230ea7f4f692d3905f3bbc8af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41b3138c42f999815768b5dfb8cd1cee |
| publicationDate |
2011-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110136299-A |
| titleOfInvention |
Optical scanner calibration element, how to manufacture it and how to use it to calibrate the optical scanner |
| abstract |
The disclosed optical scanner correction element may comprise a pattern formed of photoresist on a substrate. In addition, the method of manufacturing the disclosed optical scanner correction element may include forming, exposing and developing a photoresist layer. In addition, the disclosed optical scanner correction method may irradiate light onto the pattern of the optical scanner correction element, detect the reflected light reflected from the pattern, and correct the optical scanner based thereon. |
| priorityDate |
2010-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |