| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-27 |
| filingDate |
2008-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64b8d5dec27541342304bbf295bf40e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a549d2b56fbabdf2cc6d01a236e3b138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ca8df0f7e88f59f2c1b45d44676cf4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_765f49c6303497071a7f9328a877e2c3 |
| publicationDate |
2011-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110133065-A |
| titleOfInvention |
Compound for photoacid generator, resist composition using same, pattern formation method |
| abstract |
The sulfonic acid onium salt represented by the following formula (1) can be used as an excellent radiation sensitive acid generator for a resist composition. By using the resist composition containing this sulfonate onium salt, a favorable pattern can be formed. [Formula 1] In formula (1), R 1 represents a monovalent organic group, Q + represents a sulfonium cation or iodonium cation. |
| priorityDate |
2007-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |