http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110121020-A

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filingDate 2010-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df87254b3f9873aee59859a2480e32c6
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publicationDate 2011-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110121020-A
titleOfInvention How to reduce defects when arranging spherical oxide particles
abstract The present invention relates to a method for treating spherical oxide particles comprising heating the spherical oxide particles at a temperature higher than room temperature. The present invention relates to spherical oxide particles synthesized by the sol-gel method, specifically, silica particles, which are regularly treated by heat treatment. It is an object to increase the volume stability of the silica particles by reducing the occurrence of defects. Since the silica layer having less structural defects produced according to the present invention has high physical stability and maintains crystallinity over a wide area, the silica layer can be applied to a region requiring an optical crystal having excellent optical characteristics such as a light reflection layer and an optical waveguide.
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Total number of triples: 33.