| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f7a85d730847339e0c2e621c6c6fd96e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F11-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-003 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2004-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2da7048163140e81fc8403ef2da249d6 |
| publicationDate |
2011-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110118735-A |
| titleOfInvention |
Precursor for Metal Oxide Layer or Metal Oxide Film Deposition |
| abstract |
The present invention relates to general formula OCR 1 (R 2 ) CH 2 X [wherein R 1 is H, or an alkyl group, R 2 is an optionally substituted alkyl group, X is OR, and NR 2 (where R is an alkyl group And a substituted alkyl group), and a rare earth metal precursor used for metalorganic chemical vapor deposition (MOCVD). The present invention also relates to a method of preparing the precursor and a method of depositing a metal oxide layer from the precursor. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160015037-A |
| priorityDate |
2003-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |