Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-12 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 |
filingDate |
2011-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af1d986367f32cf8c2833215f18d094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a0c37cf5778df685f2ebc561782ed63 |
publicationDate |
2011-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20110116982-A |
titleOfInvention |
Direct Electrodeposition on Semiconductor |
abstract |
The present invention provides a method of electrodeposition of a metal or metal alloy on at least one surface of a semiconductor material. The method of the present invention provides a full coverage of a metal film electrodeposited on at least one surface of the semiconductor material. The method of the present invention includes providing a semiconductor material. A metal film is applied on at least one surface of the semiconductor material by an electrodeposition process. The electrodeposition process employed initially applies a low current density and, after a predetermined time period, uses current waveforms in which the current density changes to a high current density. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11380604-B2 |
priorityDate |
2010-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |