http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110110010-A

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filingDate 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7bf1f69ddc77d59d92eed5213ac499df
publicationDate 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110110010-A
titleOfInvention Multi-gradation photomask, manufacturing method of multi-gradation photomask, blank and pattern transfer method for multi-gradation photomask
abstract The light shielding portion is formed by laminating a translucent film, a phase shift adjusting film, and a light shielding film on a transparent substrate. The semi-transmissive portion is formed by laminating a translucent film and a phase shift adjusting film on a transparent substrate. The transparent part exposes a transparent substrate. The material and thickness of the transflective film and a phase shift adjustment film are set so that the phase shift amount at the time of transmission of the semi-transmissive part of the light of the typical wavelength within the range of i-g line will be 60 degrees or less with respect to the said transmissive part. .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140099427-A
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Total number of triples: 26.