| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_366802749d278c1447279515ff2967f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6875
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b50a2d594ac03e7c50eaa001f4857be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b62d37b0b30f14e30f065c613daee74d |
| publicationDate |
2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110109850-A |
| titleOfInvention |
Substrate Processing Apparatus and Substrate Processing Method |
| abstract |
The substrate processing apparatus includes a substrate holding unit for holding a substrate in a horizontal position, a rotating unit for rotating the substrate held in the substrate holding unit around a vertical axis, and a lower surface of the substrate rotated by the rotating unit. A lower surface of the substrate having a first facing surface facing at a distance from the lower surface of the substrate at an inner side of the substrate periphery, and a treatment liquid discharge port formed on the first facing surface; And a first nozzle in which the space between the first opposing surfaces is in a liquid-tight state. |
| priorityDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |