Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fe0c7d8904e7c7f70d816fbe55dc2f2f |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
filingDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0fdb5b42a41acabd247f8e73c439aeb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2dea54277645a9564b688fb3be539ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8944a394d110776631c9c93faf4cfb41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c48fe76cf241d34bfe4c337abba0889 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7a7be10b6df157d7dd444d3938335d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b827b74dbcbc8d68847a884784544f4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1eead56bb656d02287dc794b8d2bbd23 |
publicationDate |
2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20110109118-A |
titleOfInvention |
Titanium etchant composition and method for manufacturing semiconductor device using same |
abstract |
The present invention provides a titanium etchant composition and a method of manufacturing a semiconductor device using the same. This titanium etching liquid composition is a titanium remover; Corrosion inhibitors; And deionized water, wherein the corrosion inhibitor is characterized in that 5-aminotetrazole (5-aminotetrazole). With this titanium etchant composition, the titanium containing film can be selectively removed without damaging the other film. |
priorityDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |