http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110109118-A

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filingDate 2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0fdb5b42a41acabd247f8e73c439aeb
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publicationDate 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110109118-A
titleOfInvention Titanium etchant composition and method for manufacturing semiconductor device using same
abstract The present invention provides a titanium etchant composition and a method of manufacturing a semiconductor device using the same. This titanium etching liquid composition is a titanium remover; Corrosion inhibitors; And deionized water, wherein the corrosion inhibitor is characterized in that 5-aminotetrazole (5-aminotetrazole). With this titanium etchant composition, the titanium containing film can be selectively removed without damaging the other film.
priorityDate 2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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