| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-84 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02381
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02538
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-8258
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
| filingDate |
2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f80c55bd60c3361074d975cda3d0f33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06e6b52614f7505cc90411e35f18446b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76fb905fe86472478cd786b4a1242a55 |
| publicationDate |
2011-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110102293-A |
| titleOfInvention |
Method for manufacturing semiconductor substrate, Method for manufacturing semiconductor substrate, electronic device, and reaction apparatus |
| abstract |
The present invention relates to a method of manufacturing a semiconductor substrate by heat treating a portion to be thermally treated with a single crystal layer and a base substrate provided with a portion to be protected from heat applied by the heat treatment. There is provided a method of manufacturing a semiconductor substrate, comprising providing a protective layer that protects a portion to be protected from electromagnetic waves to be irradiated, and annealing the portion to be treated by irradiating the entire base substrate with electromagnetic waves. |
| priorityDate |
2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |