| abstract |
A supercritical processing apparatus and a supercritical processing method which suppress occurrence of pattern collapse and injection of a substance constituting a processing liquid into a substrate. The processing container accommodates a substrate to be treated by the supercritical fluid, and the liquid supply part supplies a processing liquid containing a fluorine compound in the processing container. The fluid outlet discharges the supercritical fluid from the processing vessel, and the pyrolysis component exclusion excludes components that promote thermal decomposition of the liquid in the processing vessel or in the liquid supplied from the liquid supply, while the heating portion is hydrofluoric. The treatment liquid containing a fluorine compound which is a roether or a hydrofluorocarbon is heated. |