abstract |
The fluorine-containing polymerizable monomer represented by following General formula (1) is disclosed. [Formula 35] In formula, R < 1> represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. n is 0 or 1, and m is an integer of 1- (3 + n). R 2 or R 3 each independently represent a hydrogen atom or a protecting group. The resist using the fluorine-containing polymer polymerized or copolymerized using this monomer is suitable for immersion exposure and fine processing performed by a double patterning process of immersion. |